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dc.contributor.authorKim, Hyoung-Juneen_US
dc.contributor.authorPalmer, Joyce E.en_US
dc.contributor.authorAtwater, Harry A.en_US
dc.contributor.authorGarrison, Stephen M.en_US
dc.contributor.authorQuek, Hui Mengen_US
dc.contributor.authorAjuria, Sergioen_US
dc.contributor.authorFloro, Jerrold A.en_US
dc.contributor.authorThompson, Carl V.en_US
dc.contributor.authorSmith, Henry I.en_US
dc.contributor.authorWong, Chee C.en_US
dc.contributor.authorIm, James S.en_US
dc.contributor.authorTomita, Hisashien_US
dc.contributor.authorSmith, David A.en_US
dc.contributor.authorJiran, Evaen_US
dc.contributor.authorCammarata, Robert C.en_US
dc.contributor.authorClevenger, Lawrence A.en_US
dc.contributor.authorTu, King-Ningen_US
dc.contributor.authorMaiorino, Cesar D.en_US
dc.contributor.authorLongworth, Hai P.en_US
dc.contributor.authorCho, Jaeshinen_US
dc.contributor.authorKahn, H.en_US
dc.contributor.authorFrost, Harold J.en_US
dc.contributor.authorDubner, Andrew D.en_US
dc.contributor.authorRo, Jaesangen_US
dc.contributor.authorMelngailis, Johnen_US
dc.date.accessioned2010-07-16T03:38:02Z
dc.date.available2010-07-16T03:38:02Z
dc.date.issued1987-01en_US
dc.identifierRLE_PR_129_02en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/56995
dc.descriptionContains reports on twelve research projects.en_US
dc.description.sponsorshipNational Science Foundation (Grant ECS 85-06505)en_US
dc.description.sponsorshipU.S. Air Force - Office of Scientific Research (Contract AFOSR-85-0154)en_US
dc.description.sponsorshipSemiconductor Research Corporation (Contract 87-SP-080)en_US
dc.description.sponsorshipNational Science Foundation (Grant ECS 85-06565)en_US
dc.description.sponsorshipInternational Business Machines, Inc.en_US
dc.description.sponsorshipSony International Business Machines, Inc.en_US
dc.description.sponsorshipNational Science Foundation (Grant DMR 84-18718)en_US
dc.description.sponsorshipInternational Business Machines, Thomas J. Watson Research Centeren_US
dc.description.sponsorshipJoint Services Electronics Program (Contract DAALO3-86-K-0002)en_US
dc.description.sponsorshipNational Science Foundation (Grant DMR 85-06030)en_US
dc.description.sponsorshipCharles Stark Draper Laboratory (Contract DL-H-261827)en_US
dc.description.sponsorshipNippon Telegraph and Telephone, Inc.en_US
dc.language.isoenen_US
dc.publisherResearch Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)en_US
dc.relation.ispartofMassachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1987en_US
dc.relation.ispartofKinetic Phenomena in Thin Film Electronic Materialsen_US
dc.relation.ispartofseriesMassachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 129en_US
dc.rightsCopyright (c) 2008 by the Massachusetts Institute of Technology. All rights reserved.en_US
dc.subject.otherKinetic Phenomena in Thin Film Electronic Materialsen_US
dc.subject.otherNormal Grain Growth in Ultrathin (˂1000 Å) Films of Siliconen_US
dc.subject.otherNormal Grain Growth in Ultrathin (˂1000 Å) Films of Germaniumen_US
dc.subject.otherSecondary Grain Growth in Ultrathin (˂1000 Å) Films of Siliconen_US
dc.subject.otherSecondary Grain Growth in Ultrathin (˂1000 Å) Films of Germaniumen_US
dc.subject.otherGraphoepitaxy of Sien_US
dc.subject.otherGraphoepitaxy of Geen_US
dc.subject.otherGraphoepitaxy of Model Materialsen_US
dc.subject.otherEpitaxy via Surface-Energy-Driven Grain Growthen_US
dc.subject.otherZone Melting Recrystallization of Silicon on Insulatorsen_US
dc.subject.otherProperties of Grain Boundaries with Controlled Orientations in Thin Silicon Filmsen_US
dc.subject.otherProperties of Grain Boundaries with Controlled Locations in Thin Silicon Filmsen_US
dc.subject.otherMetastable Phase Formation in Lithographically Defined Particles of Semiconductorsen_US
dc.subject.otherKinetics of Silicide Formation at Refractory Metal-Silicon Contactsen_US
dc.subject.otherGrain Growth in Thin Films of Aluminumen_US
dc.subject.otherThin Metallic Interconnectsen_US
dc.subject.otherNarrow Metallic Interconnectsen_US
dc.subject.otherElectromigration at Aluminum-Silicon Contacts in Integrated Circuitsen_US
dc.subject.otherComputer Modeling of Microstructural Evolution in Thin Filmsen_US
dc.subject.otherFocussed Ion Beam Induced Depositionen_US
dc.titleKinetic Phenomena in Thin Film Electronic Materialsen_US
dc.typeTechnical Reporten_US


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